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Introduced |
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AZO, IZO asd GZO Sputtering Target |
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Description |
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Al2O3 and Ga2O3 doped ZnO (AZO and GZO) semiconductors are promising as alternatives to ITO for thin-film transparent electrode applications. In particular, AZO thin films, with a low resistivity and materials that are inexpensive and non-toxic, are the best candidates.
Serve as the raw materials for the sputter deposition of a variety of thin films and coatings used in the microelectronic, flat panel display, data storage, optical glass coating, and other industries, the core process technologies used in coating material and target manufacturing include:
Casting (vacuum or atmospheric), rolling, forging (hot / cold), pressing (cold, hot, uniaxial or isotropic), sintering, spraying (plasma, wire). CAM runs all these process technologies, including cutting, milling, sawing, grinding, etc.
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Contact Us |
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Company Name: |
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Cathay Advanced Materials Limited |
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Company Address: |
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B6208, Jinbao Chuangye Jiayuan, Zhongkai High Technology Development Zone, Huizhou, Guangdong, China |
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Guangdong |
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86-752-2627166 |
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Full Name (Department): |
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Mrs. Tao Zhen () |
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